Product Information

Lapping and Polishing Substrate

LEATEC provides lapping and polishing substrates to meet customers' high precision requirements for thickness and flatness.

Through surface treatment, LEATEC can meet customers’ requirements of high precision production process for small wire diameter and wire width.

Change the thickness and surface flatness

Machining characteristics:

. Thickness Tolerance ±  0.01 mm

. Flatness can reach 0.1 mm

. Thickness variation (TTV) < 0.02 mm

Product Application

Lapping and polishing can be applied to...

. Automotive Pressure Sensor

. Platinum Temperature Sensor

. Wafer Growth Carrier Board

Lapping Machining Specifications:

Specification Standard Product Customized Product
Thickness Tolerance ± 0.02mm ± 0.015mm
Thickness variation (TTV) < 20µm < 15µm
Warpage 0.003 mm/mm 0.0025 mm/mm
Surface scratches 1. Many scratches and deeper. 2. Scratch depth > 20µm. 1. Many scratches and shallower. 2. Scratch depth 10~20µm.
Flatness  < 100 µm < 80 µm

Polishing Machining Specifications:

Specification Standard Product
Thickness Tolerance ± 0.02mm
Thickness variation (TTV) < 10µm
Warpage 0.003 mm/mm
Surface scratches Visually no scratches
Flatness < 80 µm
Surface Roughness (Ra) 0.02 ~ 0.05 µm

96% Al₂O₃ substrate surface characteristics

96% Al₂O₃ lapped and polished substrate surface characteristics